Equipment Listings - Wafer Metrology Equipment

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  • IEC# 117773 - Tencor 7700 Patterned Wafer Inspection System. Can detect defects as small as 0.15 µm, while defects below 0.2 µm can be detected on many process levels, including nitride, oxide, polysilicon and TEOS films. Capable of measuring defects on...
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  • IEC# 117777 - Estek WIS 850 (WIS 850) - Detection 0.17 um on Silicon at 95% capture rate. Verified by NIST Standards. 2 to 8 inch capable with proper setup. Dark and light channel system. Dark channel is used for detecting particles and any light scattering...
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  • IEC# 117771 - Tencor 5500 Wafer Particle Monitor. "System is in perfect - like new - condition". Measures surface contamination on unpatterned wafers from 100mm to 200mm diameter. Detects particles as small as 0.15 µm in diameter. Identifies particle locations...
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  • IEC# 117772 - Tencor 4500 Wafer Contamination Monitor. Measures surface contamination on unpatterned wafers from 50mm to 150mm diameter. Detects particles as small as 0.2 µm in diameter. Identifies particle locations and sizes and displays or prints info as color
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  • IEC# 117776 - Estek WIS 800 (WIS 800) - Detection 0.22 um on Silicon at 95% capture rate. Verified by NIST Standards. 2 to 8 inch capable with proper setup. Dark and light channel system. Dark channel is used for detecting particles and any light scattering...
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  • IEC# 117774 - Tencor 7600 delivers critical defect data quickly. A multi-thresholding capability allows a virtually unlimited number of data collection thresholds to be established for different regions of the device. Substrate sizes: 100, 125, 150, 200 mm...
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  • IEC# 117775 - Tencor Surfscan 6420 (Surfscan 6420) - Excellent Condition - Only used a few times; Currently Facilitized in the fab; Capable of 2" - 8" wafers; Low angle optics; Non-Patterned surface Inspection System; 0.10 micron Defect Sensitivity @ 95% capture;
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