Equipment Listings - Chemical Vapor Depositors

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• • IEC# 117796 - Applied Materials Model P5000, Cluster PECVD Tool. Wafer size 150mm with two (2) Oxide Chambers. Capable of Silicide Etching, Software revision level of 4.26. Includes total of two (2) Neslabs (one is standard + one additional) and a EMO Guard...
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  • IEC# 117797 - Applied Materials Model 5000CVD, Cluster PECVD Tool. Wafer size 150mm. Three (3) Process Chambers: Oxide: LH DRYVAC 100S; RUVAC 250. Software Revision Level Boss 4.8; Process Gasses TEOS/O2/C3F8; Accessories include: Chiller, LL Pump, TRIVAC...
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