Equipment Listings - Lithography

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• • IEC# 117789 - Semix Tazmo Manual Photoresist Coater, wafer size 100-150mm. Two (2) tracks; Four (4) Cassette Elevators; One (1) Photoresist Coat Station; One (1) Photoresist Dispenser; Three (3) Hot Plates; includes Temperature control cables. Purchased in 1992.
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  • IEC# 117788 - Canon EX-4 Deep UV Wafer Stepper, wafer size 100-200mm. Wafer handler size 100mm – 200mm. Reticle Plate Size 6 in x 6 in.; Site to Site Alignment. Software Revision Level is Canon Main 11.08b. Process track is inline. Environment enclosure is...
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  • IEC# 117787 - Nikon NRS- S2O2A Photolithography Exposure, Deep UV Wafer Stepper, Quantity (1)
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  • IEC# 117790 - Tel Mark 7 'xerogel' designed coater. It has 1 xerogel hotplate that is made to dispense ammonia gas - the ammonia gas is delivered via an ammonium hydroxide/ammonia bubbler. It has one low oxygen plate several standard hotplates and cool plates...
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  • IEC# 117786 - Nikon NSR 2005i8a I-Line Wafer Stepper, wafer size 100mm – 150mm. Plate size 6in x 6inch. Process track is inline capable. Left interface. Environmental enclosure is provided. Reduction magnification: 5:1. Software upgrade for Ethernet...
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