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Machine Listing - Chemical Vapor Depositors

IEN 117796
Year (Age) 1992
Type Silicide Etcher
Equipment Class Wafer Fabrication
Model P5000
Quantity One (1)
Manufacturer Applied Materials

  Applied Materials Model P5000, Cluster PECVD Tool. Wafer size 150mm with two (2) Oxide Chambers. Capable of Silicide Etching, Software revision level of 4.26. Includes total of two (2) Neslabs (one is standard + one additional) and a EMO Guard Ring. Wafer Type: SEMI Major Flat; Helium Cooling: Yes, with MKS MFC. Manufactured in 1992.